A Physics Based Resistance Model of the Overlap Regions in LDD-MOSFETs

نویسندگان

  • E.Gondro
  • F. Schuler
چکیده

A new resistance model for lightly doped source/drain regions featuring a nonlinear gate voltage dependence has been implemented in the Bsim3v3 model. This is achieved by separating the LDS(D) resistance into a voltage dependent accumulation and a spreading part.

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تاریخ انتشار 1998